14 Dec
2015
14 Dec
'15
7:41 p.m.
On Mon, 14 Dec 2015, Dave McGuire via vcf-midatlantic wrote:
On 12/14/2015 07:11 PM, Jonathan Gevaryahu via vcf-midatlantic wrote:
Yeah 300F was completely wrong, I was mixing baking floppies up with baking EPROMS after x-ray (not UV!) based erasure (which really does need 300F).
Can you tell me more about this? Does baking somehow address the problem of surface state creation during X-ray erasure?
(I type this with a glance at a stack of trays containing several thousand non-windowed EPROM-based microcontrollers, and another glance over at my X-ray machine..)
-Dave
You forgot to mention your electron microscope. Mike Loewen mloewen@cpumagic.scol.pa.us Old Technology http://q7.neurotica.com/Oldtech/